Nano-Heater Sources by Exothermic Reacting Nanostructures For Time-Controlled, Nanoscale-Localized Thermal Power and Materials Processing

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Intellectual Property

ID:		UML 06-17
IP Type:		Licensable Technology
Title:		Nano-Heater Sources by Exothermic Reacting Nanostructures For Time-Controlled, Nanoscale-Localized Thermal Power and Materials Processing
Inventor:		Charalabos Doumanidis
Summary:		The nano-heater technology utilizes significant advances in nanoscience research to address the current technical constraints with thermal heating in nanomanufacturing. The collaboration between the three Universities, Northeastern University, University of Cyprus and the University of Massachusetts Lowell bring together their wealth of expertise in the area of nanotechnology. Together the scientific team has developed a technology on the nanoscale that enables local heat selectivity and time-exposure control. The selectivity and control of Nano-Heaters will lead to dramatic reduction in thermal budgets and superior processing quality in annealing, oxidation and chemical vapor deposition (CVD) of semiconductors. Thermal self-processing of electronics with layered sources patterns will obviate the compromised performance and expense of rapid thermal processing (RTP) reactors and furnaces. Up to now, the need for external connections with macroscale power supplies has negated many of the benefits of miniaturization.
Tech Type:		Nanotechnology/NEMS
URL:		http://www.uml.edu/cvip
Contact:		Susu Wong, 978 934 4722, susu_wong@uml.edu
Organization:		University of Massachusetts Lowell

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