Photocyclodimerizable Copolymers for Functionalized Textiles

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Intellectual Property

ID:		UML 06-06
IP Type:		Licensable Technology
Title:		Photocyclodimerizable Copolymers for Functionalized Textiles
Inventor:		John Warner
Summary:		Professor John Warner and his research team have developed environmentally friendly photo-resist polymers and novel methods that could replace some of the hazardous chemicals commonly found in coatings of materials such as PerFluoroChemicals (PFCs). The photo-resist polymers are water-soluble but can be immobilized on a hydrophilic substrate upon irradiation with ultraviolet light. There are many opportunities to exploit this technology. Results were validated to show the ability to “tune” the photoreactivity of these polymers to precisely control the reaction extent and sensitivity. Professor Warner has demonstrated systems with sensitivities as low as 150/J/cm2, which provides us with the ability to manipulate the properties of the substrate such as water repellent, porosity, anti-bacterial, toning and reversible toning.
Tech Type:		Nanotechnology/NEMS
URL:		http://www.uml.edu/cvip
Contact:		Susu Wong, 978 934 4722, susu_wong@uml.edu
Organization:		University of Massachusetts Lowell

Display all intellectual properties for John Warner
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